Scientists Overcome a Major Electrical Bottleneck in Next-Generation Semiconductors

Researchers at KAIST and Sungkyunkwan University created a monolithic two-dimensional semiconductor structure using platinum diselenide that eliminates the conventional metal-semiconductor junction, sharply reducing contact resistance. By mapping charge movement at nanometer scale using Atomic Force Microscopy, they demonstrated that electrical current flows smoothly without disruption, a breakthrough addressing a fundamental obstacle limiting smaller, more energy-efficient chips.